Silvaco and Dassault Systèmes Partner to Streamline Semiconductor Manufacturing with Digital Twin Workflows
Event summary
- Silvaco and Dassault Systèmes announced a partnership on August 18, 2026, to develop interoperable digital twin workflows for semiconductor manufacturing.
- The collaboration combines Silvaco's feature-scale semiconductor process simulation with Dassault Systèmes' multiphysics simulation capabilities.
- The partnership aims to improve understanding of how equipment conditions influence wafer-level outcomes, accelerating first-time-right process development.
- Initial focus includes connecting plasma simulation with process simulation and enabling structural analysis of semiconductor structures.
The big picture
The partnership addresses the growing complexity in semiconductor manufacturing, where shorter development cycles and higher yields are critical. By enabling more predictive engineering decisions, this collaboration could set a new standard for digital twin applications in the industry. The integration of multiscale simulation technologies is particularly noteworthy as it aims to reduce the need for costly physical experimentation in fabrication plants.
What we're watching
- Adoption Pace
- The pace at which semiconductor manufacturers will integrate these digital twin workflows into their existing processes.
- Competitive Response
- How competitors in the semiconductor simulation space will react to this partnership and whether they will develop similar solutions.
- Technical Integration
- The effectiveness of the technical integration between Silvaco's and Dassault Systèmes' simulation technologies in real-world applications.
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