Kioxia and Sandisk Launch 10th-Gen 3D Flash Production at Kitakami Plant
Event summary
- Kioxia and Sandisk began producing 10th-generation 3D flash memory at their Kitakami Plant Fab2 facility in Japan.
- The facility, opened in September 2025, previously produced 8th-generation products and now scales up with the new technology.
- Both generations use CBA (CMOS directly Bonded to Array) technology for high performance, capacity, and low power consumption.
- The joint venture framework between Kioxia and Sandisk has been extended through December 2034.
The big picture
The start of 10th-generation 3D flash memory production at Kioxia's Kitakami Plant marks a significant milestone in the semiconductor industry. This move underscores the strategic importance of the long-standing partnership between Kioxia and Sandisk, which has driven innovation in NAND flash memory for over two decades. The extension of their joint venture framework through 2034 highlights their commitment to maintaining technological leadership and addressing the escalating demand for advanced memory solutions.
What we're watching
- Technology Leadership
- How the 10th-generation 3D flash memory will impact market share and competitive positioning against other semiconductor manufacturers.
- Operational Efficiency
- The effectiveness of AI-driven production enhancements in improving manufacturing efficiency and reducing costs at the Kitakami facility.
- Market Demand
- Whether the increased production capacity can meet the growing demand for high-performance flash technologies, particularly in AI and data center applications.
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