Bruker Expands Photothermal AFM-IR Capabilities to Tackle Semiconductor Miniaturization Challenges — Bruker Corporation

Event summary

Bruker is accelerating development of its photothermal AFM-IR spectroscopy to address semiconductor research challenges as device architectures shrink.
The company is expanding AFM-IR use beyond contamination analysis into areas like EUV photoresist patterning and transistor scaling.
Bruker has installed its Dimension IconIR system at imec for a Joint Development Project to evaluate nanoscale chemical characterization.
The collaboration focuses on assessing how nanoscale infrared spectroscopy can address emerging semiconductor process development needs.
Bruker's Dimension IconIR system offers sub-5-nanometer resolution for label-free chemical analysis.

The big picture

Bruker's investment in photothermal AFM-IR comes as the semiconductor industry faces increasing demands for nanoscale materials characterization. The collaboration with imec underscores the strategic importance of advanced metrology in developing next-generation devices. As device architectures continue to shrink, the ability to perform precise chemical analysis at the nanoscale will be critical for maintaining Moore's Law and advancing AI-driven applications.

What we're watching

Technological Adoption: How quickly semiconductor researchers will integrate photothermal AFM-IR into their workflows and whether it becomes an industry standard.
Market Differentiation: Whether Bruker can sustain its leadership position in nanoscale infrared spectroscopy as competition intensifies.
Research Outcomes: The pace at which the collaboration with imec yields actionable insights that drive next-generation semiconductor technologies.